
Proceedings Paper
Effects of dielectric overcoating on the absorption enhancement of SOI LEDs with metal island filmsFormat | Member Price | Non-Member Price |
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Paper Abstract
Scattering from metal nanoparticles via excitation of surface plasmon (SP) resonances has the potential to dramatically increase the emission of light-emitting devices. A further redshift in the plasmon resonance is possible by overcoating the metal nanoparticles with a high refractive index medium. In this paper we report a red shift in the emission enhancement peak from Silicon on Insulator (SOI) light emitting diodes (LEDs) by overcoating the metal particles with ZnS, as determined by the electroluminescence (EL) spectra. We demonstrate a 7 fold increase in the electroluminescence at 970nm with an evident redshift from 900nm for the uncoated case.
Paper Details
Date Published: 28 December 2005
PDF: 7 pages
Proc. SPIE 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV, 603707 (28 December 2005); doi: 10.1117/12.638456
Published in SPIE Proceedings Vol. 6037:
Device and Process Technologies for Microelectronics, MEMS, and Photonics IV
Jung-Chih Chiao; Andrew S. Dzurak; Chennupati Jagadish; David V. Thiel, Editor(s)
PDF: 7 pages
Proc. SPIE 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV, 603707 (28 December 2005); doi: 10.1117/12.638456
Show Author Affiliations
S. Pillai, Univ. of New South Wales (Australia)
K. R. Catchpole, Univ. of New South Wales (Australia)
T. Trupke, Univ. of New South Wales (Australia)
K. R. Catchpole, Univ. of New South Wales (Australia)
T. Trupke, Univ. of New South Wales (Australia)
G. Zhang, Univ. of New South Wales (Australia)
J. Zhao, Univ. of New South Wales (Australia)
M. A. Green, Univ. of New South Wales (Australia)
J. Zhao, Univ. of New South Wales (Australia)
M. A. Green, Univ. of New South Wales (Australia)
Published in SPIE Proceedings Vol. 6037:
Device and Process Technologies for Microelectronics, MEMS, and Photonics IV
Jung-Chih Chiao; Andrew S. Dzurak; Chennupati Jagadish; David V. Thiel, Editor(s)
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