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Proceedings Paper

A new methodology for quantifying OPC recipe accuracy
Author(s): David Ziger; Dave Gerold; Charles King; Frank Amoroso; Joshua Tuttle; Robert Lugg
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Paper Abstract

An integrated methodology for developing recipes for optical proximity correction (OPC) is demonstrated. A complete implementation of software programs for generating the OPC corrections, determining mask and layout errors and automatically displaying contours of the worst violations has been accomplished. Integration of these elements facilitates recipe development by quantifying the effect of recipe changes on the overall critical dimension (CD) control. In this paper, a 65nm alternating aperture phase shift test mask is used for illustration of the method. The concept of a recipe comparison matrix is introduced to quantify the effect of recipe changes on across-chip metrics.

Paper Details

Date Published: 9 November 2005
PDF: 9 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599258 (9 November 2005); doi: 10.1117/12.633172
Show Author Affiliations
David Ziger, Synopsys, Inc. (United States)
Dave Gerold, Synopsys, Inc. (United States)
Charles King, Synopsys, Inc. (United States)
Frank Amoroso, Synopsys, Inc. (United States)
Joshua Tuttle, Synopsys, Inc. (United States)
Robert Lugg, Synopsys, Inc. (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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