SLM-based DUV laser writers are gaining acceptance for 2^nd level PSM and binary mask patterning. These writers can use an e-beam compatible resist enabling tool and process sharing. For binary mask patterning, critical metrics include: critical dimension uniformity (CDU), CD targeting, mask registration, defect performance and inspectability. For PSM applications, pattern fidelity matching to 1^st level and PSM overlay are also important. A Sigma7300 is being integrated into 65nm and 45nm production. Binary and PSM mask performance data will be presented. Tool self metrics to characterize SLM health will also be presented. Data conversion, data preparation and production write times will be discussed.

Date Published: 4 November 2005
PDF: 9 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59920V (4 November 2005); doi: 10.1117/12.633167

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)