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Proceedings Paper

Advanced edge roughness measurement application for mask metrology
Author(s): D. Chase; R. Kris; R. Katz; A. Tam; L. Gershtein; R. Falah; N. Wertsman
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Paper Abstract

Mask Manufacturers are continuously asked to supply reticles with reduced CD (Critical Dimension) specification, such as CD Uniformity and Mean to target. To meet this on-going trend the industry is in a quest for higher resolution metrology tools, which in-turn drives the use of SEM metrology into standard mask manufacturing process. As dimensions of integrated circuit features reduce, the negative effects of roughness of the features, and/or of components such as photo-resist and ancillary structures used to produce the features, become more pronounced since there is not necessarily a corresponding reduction of roughness with dimension reduction. As a result of the increased problems, metrics that quantify roughness of specific sections of an integrated circuit have been developed; for example, line edge roughness (LER) measures the roughness of a linear edge. This paper concentrates on one specific area of the Mask Metrology, being measurement of the different Roughness metrics of the reticle features such as lines and contacts, using a new SEM metrology tool, the Applied Materials RETicleSEM. We describe the comprehensive Roughness Analysis Algorithm package that performs precise measurements of the different Roughness metrics including Fourier analysis, auto-correlation function and correlation length. This package can be used to isolate and characterize the roughness of specific wavelength ranges that may be of interest for mask manufacturing process and/or mask quality control considerations. We conclude with sample results of Roughness Analysis on real SEM images of Reticle lines. The influence of CD roughness on the precision of measurements is considered. The proof that long-wave roughness can be one from the sources of flyers during CD measurements is presented.

Paper Details

Date Published: 9 November 2005
PDF: 7 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924N (9 November 2005); doi: 10.1117/12.632439
Show Author Affiliations
D. Chase, Applied Materials, Inc. (Israel)
R. Kris, Applied Materials, Inc. (Israel)
R. Katz, Applied Materials, Inc. (Israel)
A. Tam, Applied Materials, Inc. (Israel)
L. Gershtein, Applied Materials, Inc. (Israel)
R. Falah, Applied Materials, Inc. (Israel)
N. Wertsman, Applied Materials, Inc. (Israel)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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