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Proceedings Paper

Photomask registration specification and its impact on FLASH memory devices
Author(s): Enio Carpi; Stuart Brown; Florence Tan; Rick Edwards
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Paper Abstract

With photolithography being pushed to its limits, semiconductor device performance is becoming increasingly more sensitive to lithographic variations. More advanced lithography tools, metrology and photomasks are helping address issues like minimum feature size, tight CD control, and limited process windows. Mask registration is becoming even more important in the low k1 regime, where overlay can have a huge impact on the overall device performance and drive the error budget into unsatisfactory compromises. FLASH memory technology requires a tighter overlay control compared to logic devices. Charge retention and programming performance are particularly sensitive to overlay. In this paper, we analyze the impact of photomask registration on NOR FLASH memory fabrication using Exploratory Data Analysis approach.

Paper Details

Date Published: 4 November 2005
PDF: 7 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921K (4 November 2005); doi: 10.1117/12.632354
Show Author Affiliations
Enio Carpi, Toppan Photomasks, Inc. (United States)
Stuart Brown, Spansion LLC (United States)
Florence Tan, Spansion LLC (United States)
Rick Edwards, Spansion LLC (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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