Share Email Print

Proceedings Paper

Design and fabrication of nano-imprint templates using unique pattern transforms and primitives
Author(s): Susan MacDonald; David Mellenthin; Kevin Rentzsch; Kenneth Kramer; James Ellenson; Tim Hostetler; Ron Enck
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Increasing numbers of MEMS, photonic, and integrated circuit manufacturers are investigating the use of Nano-imprint Lithography or Step and Flash Imprint Lithography (SFIL) as a lithography choice for making various devices and products. Their main interests in using these technologies are the lack of aberrations inherent in traditional optical reduction lithography, and the relative low cost of imprint tools. Since imprint templates are at 1X scale, the small sizes of these structures have necessitated the use of high-resolution 50KeV, and 100KeV e-beam lithography tools to build these templates. For MEMS and photonic applications, the structures desired are often circles, arches, and other non-orthogonal shapes. It has long been known that both 50keV, and especially 100keV e-beam lithography tools are extremely accurate, and can produce very high resolution structures, but the trade off is long write times. The main drivers in write time are shot count and stage travel. This work will show how circles and other non-orthogonal shapes can be produced with a 50KeV Variable Shaped Beam (VSB) e-beam lithography system using unique pattern transforms and primitive shapes, while keeping the shot count and write times under control. The quality of shapes replicated into the resist on wafer using an SFIL tool will also be presented.

Paper Details

Date Published: 8 November 2005
PDF: 9 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599242 (8 November 2005); doi: 10.1117/12.632269
Show Author Affiliations
Susan MacDonald, Toppan Photomasks, Inc. (United States)
David Mellenthin, Toppan Photomasks, Inc. (United States)
Kevin Rentzsch, Toppan Photomasks, Inc. (United States)
Kenneth Kramer, Hewlett-Packard Co. (United States)
James Ellenson, Hewlett-Packard Co. (United States)
Tim Hostetler, Hewlett-Packard Co. (United States)
Ron Enck, Hewlett-Packard Co. (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?