Proceedings Paper
CW DUV light sources for inspection tools| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
We describe true continuous-wave (CW), high-power, line-narrowed, deep-ultraviolet (DUV) light sources for the high-resolution metrology tools such as wafer inspection and mask inspection systems. The 198.5-nm CW radiation with 300-mW power has also been achieved by sum-frequency mixing (SFM) of 1064-nm output from a single-frequency Yb3+ fiber amplifier with the 244-nm radiation from a frequency-doubled argon-ion laser. The 266-nm CW DUV radiation with 5 W of maximum power has been generated by frequency doubling of 532-nm green laser output. Both sources utilize Brewster-cut CsLiB6O10 (CLBO) crystal for efficient and stable DUV light generation.
Paper Details
Date Published: 8 November 2005
PDF: 8 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599243 (8 November 2005); doi: 10.1117/12.632101
Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)
PDF: 8 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599243 (8 November 2005); doi: 10.1117/12.632101
Show Author Affiliations
Jun Sakuma, Cyber Laser, Inc. (Japan)
Yasuyuki Okada, Cyber Laser, Inc. (Japan)
Tetsumi Sumiyoshi, Cyber Laser, Inc. (Japan)
Yasuyuki Okada, Cyber Laser, Inc. (Japan)
Tetsumi Sumiyoshi, Cyber Laser, Inc. (Japan)
Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)
© SPIE. Terms of Use
