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Proceedings Paper

The effect of calibration feature weighting on OPC optical and resist models: investigating the influence on model coefficients and on the overall model fitting
Author(s): Amr Abdo; Rami Fathy; Kareem Madkour; James Oberschmidt; Daniel Fischer; Mohamed Talbi
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Paper Abstract

Performing model based optical proximity correction (MB-OPC) is an essential step in the production of advanced integrated circuits that are manufactured with optical lithography technology. The accuracy of these models depends highly on the experimental data used in the model development (model calibration) process. The calibration features are weighted relative to each other depending on many aspects, this weighting plays an important role in the accuracy of the developed models. In this paper, the effect of the feature weighting on OPC models is studied. Different weighting schemes are introduced and the effect on both the optical and resist models (specifically the resist model coefficients) is presented and compared. The effect of the weighting on the overall model fitting was also investigated.

Paper Details

Date Published: 9 November 2005
PDF: 8 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599253 (9 November 2005); doi: 10.1117/12.631817
Show Author Affiliations
Amr Abdo, IBM Corp. (United States)
Rami Fathy, Mentor Graphics Corp. (Egypt)
Kareem Madkour, Mentor Graphics Corp. (Egypt)
James Oberschmidt, IBM Corp. (United States)
Daniel Fischer, IBM Corp. (United States)
Mohamed Talbi, IBM Corp. (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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