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Proceedings Paper

Status of nanoimprint lithography and device applications
Author(s): Jian Jim Wang
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Paper Abstract

Based on mechanical replication, nanoimprint lithography is an emerging technology that can achieve lithographic resolutions beyond the limitations set by light diffractions or beam scatterings in conventional lithographic techniques, while promising high-throughput patterning. This tutorial paper reviews the status and some of the recent progress in the commercial applications of this technology.

Paper Details

Date Published: 25 October 2005
PDF: 15 pages
Proc. SPIE 6013, Optoelectronic Devices: Physics, Fabrication, and Application II, 601302 (25 October 2005); doi: 10.1117/12.630002
Show Author Affiliations
Jian Jim Wang, NanoOpto Corp. (United States)

Published in SPIE Proceedings Vol. 6013:
Optoelectronic Devices: Physics, Fabrication, and Application II
Joachim Piprek, Editor(s)

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