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Proceedings Paper

Systematic photonic crystal device global and local optimization, and sensitivity analysis
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Paper Abstract

We present a set of modeling, sensitivity analysis, and design optimization methods for photonic crystal structures based on Wannier basis field expansion and efficient matrix analysis techniques. We develop the sensitivity analysis technique to analyze both refractive index perturbations and dielectric boundary shift perturbations. Our modeling method is ~1000X faster than FDTD for searching through a large number of similar device designs. We show that our optimization techniques, relying on the efficiency of the modeling and sensitivity analysis methods, enable systematic global and local optimizations of integrated optical components. We show that our design method can be controlled to favor designs without high-energy build-ups, potentially making them more fabrication-error tolerant. We present design examples and verify our designs with FDTD calculations.

Paper Details

Date Published: 24 October 2005
PDF: 10 pages
Proc. SPIE 6017, Nanophotonics for Communication: Materials and Devices II, 601704 (24 October 2005); doi: 10.1117/12.629706
Show Author Affiliations
Yang Jiao, Stanford Univ. (United States)
Shanhui Fan, Stanford Univ. (United States)
David A. B. Miller, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 6017:
Nanophotonics for Communication: Materials and Devices II
Nibir K. Dhar; Achyut K. Dutta; Kiyoshi Asakawa, Editor(s)

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