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Proceedings Paper

InAs/GaInSb superlattices as a promising material system for third generation infrared detectors
Author(s): Antoni Rogalski
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Paper Abstract

Hitherto two families of multielement detectors have been used for infrared applications scanning systems (first generation) and staring systems (second generation). Third generation systems are being developed nowadays. In the common understanding third generation JR systems provide enhanced capabilities like larger number of pixels higher frame rates better thermal resolution as well as multicolour functionality and other on-chip functions. In the class of third generation infrared photon detectors two main competitors HgCdTe photodiodes and AlGaAs/GaAs quantum well infrared photoconductors (QWIPs) are considered. However in the long wavelength infrared (LWIR) region the HgCdTe material fail to give the requirements of large format two-dimensional (2D) arrays due to metallurgical problems of the epitaxial layers such as uniformity and number of defected elements. A superlattice based InAs/GaInSb system grown on GaSb substrate seems to be an attractive to HgCdTe with good spatial uniformity and an ability to span cutoff wavelength from 3 to 25 tm. The recently published results have indicated that high performance middle wavelength infrared (MWIR) InAs/GaInSb superlatice focal plane arrays can be fabricated. Based on these very promising results it is obvious now that the antimonide superlattice technology is competing with HgCdTe dual colour technology with the potential advantage of standard III-V technology to be more competitive in costs and as a consequence series production pricing.

Paper Details

Date Published: 7 June 2005
PDF: 12 pages
Proc. SPIE 5834, 18th International Conference on Photoelectronics and Night Vision Devices, (7 June 2005); doi: 10.1117/12.628637
Show Author Affiliations
Antoni Rogalski, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 5834:
18th International Conference on Photoelectronics and Night Vision Devices
Anatoly M. Filachov; Vladimir P. Ponomarenko; Alexander I. Dirochka, Editor(s)

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