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Proceedings Paper

Oxide and fluoride coatings for the excimer wavelength 193nm
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Paper Abstract

The requirements to produce high performance coatings increase dramatically when moving from 248 nm to 193 nm. The quality of DUV thin film components is mainly determined by the optical properties of the applied layer materials. The reduction of losses due to scattering and absorption of dielectric materials is essential for excellent properties of the coating results. The most common oxide and fluoride materials SiO2, Al2O3, MgF2 and LaF3 have been investigated and optimized. Plasma ion assisted deposition was applied for the deposition of the oxide materials, using improved coating equipment such as the modified APSpro (advanced plasma source). The paper reports the results of DUV coatings using plasma ion assisted deposition for the oxide materials. Single layers of silica and alumina and multilayer systems with both materials were investigated. In addition, MgF2 and LaF3, conventionally coated at very high temperatures, have been performed to demonstrate the improved capabilities of the optimized SYRUSpro DUV for DUV applications with all the new features.

Paper Details

Date Published: 4 October 2005
PDF: 7 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59630L (4 October 2005);
Show Author Affiliations
Rainer Götzelmann, Leybold Optics GmbH (Germany)
Harro Hagedorn, Leybold Optics GmbH (Germany)
Alfons Zöller, Leybold Optics GmbH (Germany)
Alexei Kobiak, Leybold Optics GmbH (Germany)
Werner Klug, Leybold Optics GmbH (Germany)

Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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