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Proceedings Paper

Nanopositioning and nanomeasuring machine for high accuracy measuring procedures of small features in large areas
Author(s): E. Manske; T. Hausotte; R. Mastylo; N. Hofmann; G. Jäger
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Paper Abstract

Driven by increasing precision and accuracy requirements due to miniaturization and performance enhancement, measuring technologies need alternative ways of positioning, probing and measurement strategies. The paper describes the operation of the high-precision wide scale three-dimensional nanopositioning and nanomeasuring machine (NPM-Machine) having a resolution of 0.1 nm over the positioning and measuring range of 25 mm x 25 mm x 5 mm. The NPM-Machine has been developed by the Technische Universitat Ilmenau and manufactured by the SIOS Messtechnik GmbH Ilmenau. Three plane-mirror miniature interferometers and two angular sensors are arranged, to realize in all three coordinates zero Abbe offset measurements. Therefore, this device closes a gap in coordinate-measuring technique regarding resolution, accuracy and measuring range. The machines are operating successfully in several German and foreign research institutes including the Physikalisch-Technische Bundesanstalt (PTB). The integration of several, optical and tactile probe systems and scanning force microscopes makes the NPM-Machine suitable for various tasks, such as large-area scanning probe microscopy, mask and water inspection, circuit testing as well as measuring optical and mechanical precision work pieces such as micro lens arrays, concave lenses, step height standards.

Paper Details

Date Published: 19 October 2005
PDF: 11 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 596509 (19 October 2005); doi: 10.1117/12.624791
Show Author Affiliations
E. Manske, Technische Univ. Ilmenau (Germany)
T. Hausotte, Technische Univ. Ilmenau (Germany)
R. Mastylo, Technische Univ. Ilmenau (Germany)
N. Hofmann, Technische Univ. Ilmenau (Germany)
G. Jäger, Technische Univ. Ilmenau (Germany)

Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

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