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Proceedings Paper

Introduction of a die-to-database verification tool for the entire printed geometry of a die: geometry verification system NGR2100 for DFM
Author(s): Tadashi Kitamura; Kazufumi Kubota; Toshiaki Hasebe; Futoshi Sakai; Shinichi Nakazawa; Neeti Vohra; Masahiro Yamamoto; Masahiro Inoue
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Paper Abstract

The Geometry Verification System NGR2100 enables verification of the entire die, on a resist or an after-etch wafer, by comparing images of a die with corresponding target CAD data. The system detects systematic defects by variable criteria setting for allowable deformation quantities and obtains a CD distribution diagram. The result of systematic defects can then be used to make root cause analysis. The CD distribution diagram can achieve stepper aberration analysis, process windows extraction, macro-loading effect analysis, FEM measurement, and trend analysis more efficiently. Consequently, the Geometry Verification System NGR2100 will contribute to quicker TAT for DFM in Design, Lithography and Mask production.

Paper Details

Date Published: 28 June 2005
PDF: 12 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.620389
Show Author Affiliations
Tadashi Kitamura, NanoGeometry Research Inc. (Japan)
Kazufumi Kubota, NanoGeometry Research Inc. (Japan)
Toshiaki Hasebe, NanoGeometry Research Inc. (Japan)
Futoshi Sakai, NanoGeometry Research Inc. (Japan)
Shinichi Nakazawa, NanoGeometry Research Inc. (Japan)
Neeti Vohra, NanoGeometry Research Inc. (Japan)
Masahiro Yamamoto, NanoGeometry Research Inc. (Japan)
Masahiro Inoue, Topcon Corp. (Japan)

Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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