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Proceedings Paper

Advances with the new AIMS fab 193 2nd generation: a system for the 65 nm node including immersion
Author(s): Axel M. Zibold; E. Poortinga; H. v. Doornmalen; R. Schmid; T. Scherubl; W. Harnisch
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Paper Abstract

The Aerial Image Measurement System, AIMS, for 193nm lithography emulation is established as a standard for the rapid prediction of wafer printability for critical structures including dense patterns and defects or repairs on masks. The main benefit of AIMS is to save expensive image qualification consisting of test wafer exposures followed by wafer CD-SEM resist or wafer analysis. By adjustment of numerical aperture (NA), illumination type and partial coherence (σ) to match any given stepper/ scanner, AIMS predicts the printability of 193nm reticles such as binary with, or without OPC and phase shifting. A new AIMS fab 193 second generation system with a maximum NA of 0.93 is now available. Improvements in field uniformity, stability over time, measurement automation and higher throughput meet the challenging requirements of the 65nm node. A new function, “Global CD Map” can be applied to automatically measure and analyse the global CD uniformity of repeating structures across a reticle. With the options of extended depth-of-focus (EDOF) software and the upcoming linear polarisation capability in the illumination the new AIMS fab 193 second generation system is able to cover both dry and immersion requirements for NA < 1. Rigorous simulations have been performed to study the effects of polarisation for imaging by comparing the aerial image of the AIMS to the resist image of the scanner.

Paper Details

Date Published: 28 June 2005
PDF: 9 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617508
Show Author Affiliations
Axel M. Zibold, Carl Zeiss SMS GmbH (Germany)
E. Poortinga, Carl Zeiss SMS GmbH (Germany)
H. v. Doornmalen, Carl Zeiss SMS GmbH (Germany)
R. Schmid, Carl Zeiss SMS GmbH (Germany)
T. Scherubl, Carl Zeiss SMS GmbH (Germany)
W. Harnisch, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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