Share Email Print

Proceedings Paper

A proposal for the contact hole assist feature printing checker in IML
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Interference Mapping Lithography (IML) is the latest innovation to extend optical imaging solutions to contact hole printing. This approach optimizes the placement of assist features to enhance the process window of the contact hole layer. However, the printing of assist features is a concern of the IML technology. This study presents a checking scheme to analyze the assist feature printing using the aerial image simulation. If the checking method confirms the assist feature printing, the adjustment algorithm optimizes the assist feature design. An example of a 5×5 array pattern is employed to demonstrate the methodologies; which avoid assist feature printing yet still improve the process window by adding the appropriate assist feature design.

Paper Details

Date Published: 28 June 2005
PDF: 6 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617191
Show Author Affiliations
Jason Shieh, ASML Taiwan (Taiwan)
Robert Socha, ASML US (United States)
Xuelong Shi, ASML MaskTools (United States)
Alek Chen, ASML Taiwan (Taiwan)

Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?