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Proceedings Paper

Effective IP protection method of mask data using OASIS format
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Paper Abstract

We have been developing intellectual properties (IP) protection software using OASIS format. In the Photomask Technology 2004 we presented that by taking advantage of repetition presentation of OASIS, it becomes possible to express arrayed patterns without any generation of new cells, which also brings less overhead and further compaction of the result file. As a result, we could rebuild the hierarchy without cell generation and reduce the output file size. In this paper, additionally we have applied a unique compression function CBLOCK defined in OASIS format. CBLOCK can compress any part of OASIS file. The experimental results show that there are no redundant cells generated and the file size has become approximately 20 times smaller than conventional methods.

Paper Details

Date Published: 28 June 2005
PDF: 9 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617152
Show Author Affiliations
Kuninori Nishizawa, SII NanoTechnology Inc. (Japan)
Masakazu Endo, SII NanoTechnology Inc. (Japan)
Kokoro Kato, SII NanoTechnology Inc. (Japan)

Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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