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Proceedings Paper

Investigation of electrical, structural, and optical properties of very thin oxide/a-Si:H/c-Si interfaces passivated by cyanide treatment
Author(s): Emil Pincik; Hikaru Kobayashi; Stanislav Jurecka; Matej Jergel; Helena Gleskova; Masao Takahashi; Robert Brunner; Naozumi Fujiwara; Jarmila Mullerova
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Paper Abstract

The paper deals with investigation of electrical, structural and optical properties of very thin oxide/a-Si:H interfaces passivated by chemical treatment by KCN and HCN solutions. The oxide layers were prepared by thermal, chemical and plasma or ion beam assisted oxidations. Interface properties were evaluated by charge version of deep level transient spectroscopy, C-V measurements, X-ray diffraction (in both Bragg-Brentano and grazing incidence modes), optical reflectance (based on genetic algorithm) and photoluminescence. Considerable interest was devoted to distribution of three dominant groups of a-Si:H defect states in the band gap of the semiconductor as well as their response to bias annealing and light soaking experiments. We will present also dominant result - increase of the efficiency of a-Si:H based solar cells after chemical treatment. Finally, we will present the chemical passivation and oxidization as promising techniques suitable for applications in the field of nanotechnology.

Paper Details

Date Published: 8 December 2004
PDF: 7 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.608684
Show Author Affiliations
Emil Pincik, Institute of Physics (Slovak Republic)
Hikaru Kobayashi, Osaka Univ. (Japan)
Stanislav Jurecka, Univ. of Zilina (Slovak Republic)
Matej Jergel, Institute of Physics (Slovak Republic)
Helena Gleskova, Princeton Univ. (United States)
Masao Takahashi, Osaka Univ. (Japan)
Robert Brunner, Institute of Physics (Slovak Republic)
Naozumi Fujiwara, Osaka Univ. (Japan)
Jarmila Mullerova, Univ. of Zilina (Slovak Republic)

Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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