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Proceedings Paper

Protection of collector optics in an LPP based EUV source
Author(s): C. L. Rettig; O. V. Khodykin; J. R. Hoffman; W. F. Marx; N. R. Bowering; E. Vargas; A. I. Ershov; I. V. Fomenkov; W. N. Partlo
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Paper Abstract

In a laser produced plasma (LPP) EUV source the multilayer mirror (MLM) collector optic will be exposed to a flux of energetic ions and neutral atoms ejected from the plasma as well as condensable vapor from excess target material. We are investigating various techniques for reducing the contamination flux and for in-situ removal of the contamination. The protection strategies under investigation must be compatible with gaseous and condensable target materials such as Xe, Sn, In, Li, and other elements. The goal is to develop MLM structures that can withstand elevated temperatures and develop protective barrier coatings that reduce erosion of the mirror surface. Results of MLM exposure to energetic ion beams and thermal atomic sources are presented. Changes in EUV reflectivity of MLM structures after exposure to ions and deposition of target material have been performed on samples cleaned by these developmental processes. In this paper, we will summarize our initial results in these areas and present techniques for mitigation of MLM damage from the source.

Paper Details

Date Published: 6 May 2005
PDF: 9 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.601517
Show Author Affiliations
C. L. Rettig, Cymer, Inc. (United States)
O. V. Khodykin, Cymer, Inc. (United States)
J. R. Hoffman, Cymer, Inc. (United States)
W. F. Marx, Cymer, Inc. (United States)
N. R. Bowering, Cymer, Inc. (United States)
E. Vargas, Cymer, Inc. (United States)
A. I. Ershov, Cymer, Inc. (United States)
I. V. Fomenkov, Cymer, Inc. (United States)
W. N. Partlo, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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