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Proceedings Paper

Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography
Author(s): Tsukasa Hori; Takayuki Yabu; Takanobu Ishihara; Takayuki Watanabe; Osamu Wakabayashi; Akira Sumitani; Kouji Kakizaki; Hakaru Mizoguchi
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Paper Abstract

A feasibility study of next generation 6 kHz ArF laser for lithography is presented. High repetition rate operation of excimer lasers faces two technical challenges: 1) the occurrence of acoustic waves caused by the discharge in the laser chamber and 2) the huge energy consumption of the large gas flow fans. This paper describes our approach to dampen the acoustic waves. A computer simulation of acoustic wave generation inside the discharge chamber was done. The simulation correlates well with Schlieren photography measurements that visualized the acoustic waves. Based on these results, a chamber for 6 kHz repetition rate was newly designed. Measured spectral data (FHWM and E95) proved that the acoustic wave perturbation was remarkably reduced. A very efficient design method for high repetition rate laser chamber has therefore been established.

Paper Details

Date Published: 12 May 2005
PDF: 8 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); doi: 10.1117/12.601438
Show Author Affiliations
Tsukasa Hori, Komatsu Ltd. (Japan)
Takayuki Yabu, Komatsu Ltd. (Japan)
Takanobu Ishihara, Komatsu Ltd. (Japan)
Takayuki Watanabe, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Kouji Kakizaki, Ushio Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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