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Proceedings Paper

Optical damage mechanisms in hafnia and silica thin films
Author(s): Lloyd L. Chase; Alex V. Hamza; Howard W. Lee
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Paper Abstract

Optical damage mechanisms for submicron thick, electron beam deposited HfO2 and SiO2 films on BK-7 substrates have been investigated by monitoring the emission of neutral constituents during excitation with time-delayed pairs of 70 ps laser pulses at a wavelength of 1064 nm. In silica, and probably also HfO2, linear absorption is the mechanism for energy deposition into the films by the laser beams. Sporadic ablation observed for the HfO2 films may be related to optical conditioning of multilayer HfO2-SiO2 high-reflector coatings.

Paper Details

Date Published: 29 July 1992
PDF: 6 pages
Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); doi: 10.1117/12.60126
Show Author Affiliations
Lloyd L. Chase, Lawrence Livermore National Lab. (United States)
Alex V. Hamza, Lawrence Livermore National Lab. (United States)
Howard W. Lee, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 1624:
Laser-Induced Damage in Optical Materials: 1991
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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