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Proceedings Paper

Observation and control of thin-film defects using in-situ total-internal-reflection microscopy
Author(s): Forrest L. Williams; Gary A. Peterson Jr.; Reed A. Schmell; Charles K. Carniglia
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Paper Abstract

Total internal reflection microscopy (TIRM) is an inspection method that yields an image of the defects in a surface and/or a dielectric thin film. By installing a TIRM system in a vacuum-deposition chamber, the formation of thin-film defects (visible as point-scatter sites) is directly observable. By using such a system, we have examined the effects of deposition conditions on thin-film defect generation. In this preliminary investigation, the rate of defect accumulation in ZrO2 thin films produced by electron-beam (e-beam) evaporation displays a dependence on substrate cleanliness, with cleaner surfaces yielding lesser defect-formation rates. In addition, the presence of film crystallites can be observed by in-situ TIRM, and shows a dependence on the oxygen partial pressure during deposition.

Paper Details

Date Published: 29 July 1992
PDF: 15 pages
Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); doi: 10.1117/12.60111
Show Author Affiliations
Forrest L. Williams, S. Systems Corp. (United States)
Gary A. Peterson Jr., Univ. of New Mexico (United States)
Reed A. Schmell, S. Systems Corp. (United States)
Charles K. Carniglia, S. Systems Corp. (United States)

Published in SPIE Proceedings Vol. 1624:
Laser-Induced Damage in Optical Materials: 1991
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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