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Proceedings Paper

Optical properties of titania films prepared by ion-assisted deposition
Author(s): M. Ghanashyam Krishna; K. Narasimharao; Sangeneni Mohan
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Paper Abstract

Thin films of titanium dioxide have been deposited using ion-assisted deposition with oxygen ions produced using: (1) a Heitmann ion source (HIS) for ions with energy less than 100 eV and (2) a broad beam Kaufman ion source (KIS) for ions in the energy range 100 to 500 eV and current densities up to 100 (mu) A/cm2. It has been observed that the refractive index of the films increases up to 300 eV and the extinction coefficient only nominally up to 300 eV. The maximum refractive index obtained was 2.49 at an energy of 300 eV and 50 (mu) A/cm2 current density. The refractive index of the films deposited using the HIS was lower than those deposited using the KIS. The refractive index of the HIS films increased with increasing substrate temperature with very little change in the extinction coefficient.

Paper Details

Date Published: 29 July 1992
PDF: 7 pages
Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); doi: 10.1117/12.60099
Show Author Affiliations
M. Ghanashyam Krishna, Indian Institute of Science (India)
K. Narasimharao, Indian Institute of Science (India)
Sangeneni Mohan, Indian Institute of Science (India)

Published in SPIE Proceedings Vol. 1624:
Laser-Induced Damage in Optical Materials: 1991
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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