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Proceedings Paper

Full spectral analysis of line width roughness
Author(s): L. H. A. Leunissen; G. F. Lorusso; M. Ercken; J. A. Croon; H. Yang; A. Azordegan; T. DiBiase
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Paper Abstract

Various approaches can be used to quantify line width roughness (LWR). One of the most commonly used estimators of LWR is the standard deviation. However, this approach is incomplete and ignores a substantial amount of information. We propose here a full spectral analysis to investigate and monitor LWR. A variety of estimators, such as standard deviation, peak-to-valley, average, correlation length and Fourier analysis have been implemented on-line on CDSEM. The algorithms were successfully tested against e-beam written LWR patterns, both deterministic and random. This approach allows a fully automated investigation of LWR. This methodology was used to monitor LWR over a long period of time, benchmark new resists and to investigate the effect of LWR on device performance and yield.

Paper Details

Date Published: 10 May 2005
PDF: 11 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.600185
Show Author Affiliations
L. H. A. Leunissen, IMEC (Belgium)
G. F. Lorusso, KLA-Tencor (United States)
M. Ercken, IMEC (Belgium)
J. A. Croon, IMEC (Belgium)
H. Yang, KLA-Tencor Corp. (United States)
A. Azordegan, KLA-Tencor Corp. (United States)
T. DiBiase, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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