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Proceedings Paper

Perfluoropolyethers as novel materials for soft lithography
Author(s): Jason P. Rolland; Eric C. Hagberg; Kenneth R. Carter; Joseph M. DeSimone
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Paper Abstract

Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high resolution (<100 nm) pattern transfer and imprint lithographic processes. PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity (minimal shrinkage), resist swelling by most organics, endure repetitive molding procedures, and out-perform routinely-used polydimethylsiloxane when replicating sub-micron sized features. We report nanoscale replicas of substrates, and the use of these replicas as molds, having features as small as 70 nm with no apparent loss of resolution.

Paper Details

Date Published: 6 May 2005
PDF: 5 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598849
Show Author Affiliations
Jason P. Rolland, Univ. of North Carolina at Chapel Hill (United States)
Eric C. Hagberg, IBM Almaden Research Ctr. (United States)
Kenneth R. Carter, IBM Almaden Research Ctr. (United States)
Joseph M. DeSimone, Univ. of North Carolina at Chapel Hill (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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