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Proceedings Paper

Step and repeat UV-nanoimprint lithography using a large area stamp
Author(s): Jun-ho Jeong; Young-suk Sim; Hyonkee Sohn; Eung-sug Lee
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Paper Abstract

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. To apply a large-area stamp to step-and-repeat UV-NIL in an atmospheric environment for high-throughput, we proposed a new step-and-repeat UV-NIL process using an elementwise patterned stamp (EPS), which consists of elements separated by channels. The proposed UV-NIL is able to imprint an 8-in. wafer with a 5 sq. in EPS in four times. 50 - 80 nm features of the EPS were successfully transferred over 8-in. wafers. The experiments demonstrated that a large-area EPS in the step-and-repeat UV-NIL can be used for imprinting 8-in. wafers in an atmospheric environment.

Paper Details

Date Published: 6 May 2005
PDF: 9 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005);
Show Author Affiliations
Jun-ho Jeong, Korea Institute of Machinery and Materials (South Korea)
Young-suk Sim, Korea Institute of Machinery and Materials (South Korea)
Hyonkee Sohn, Korea Institute of Machinery and Materials (South Korea)
Eung-sug Lee, Korea Institute of Machinery and Materials (South Korea)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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