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Proceedings Paper

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns
Author(s): Jangho Shin; SukJoo Lee; Hochul Kim; Chan Hwang; SeongSue Kim; Sang-Gyun Woo; Han-Ku Cho; Joo-Tae Moon
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Paper Abstract

Various pupil-fill measurement techniques are evaluated to monitor non-telecentricity of an illuminator as followings: transmission image sensor (TIS) of ASML, source metrology instrument (SMI) of Litel, Fresnel zone plate (FZP) of Philips, and non-telecentricity measurement technique using traditional overlay marks, which is based on an idea that pattern shift is proportional to the amount of defocus. Based on aerial image simulation with measured non-telecentricity, its effect on sub-70 nm device patterning is discussed. Experimental data shows that some of pupil-fills appear more than 70 milli-radian of source displacement error and it may cause serious pattern shift and/or asymmetry. Detailed descriptions of measurement techniques and experimental results are presented.

Paper Details

Date Published: 12 May 2005
PDF: 9 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); doi: 10.1117/12.598655
Show Author Affiliations
Jangho Shin, Samsung Electronics Co., Ltd. (South Korea)
SukJoo Lee, Samsung Electronics Co., Ltd. (South Korea)
Hochul Kim, Samsung Electronics Co., Ltd. (South Korea)
Chan Hwang, Samsung Electronics Co., Ltd. (South Korea)
SeongSue Kim, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Han-Ku Cho, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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