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Proceedings Paper

Integrating Philips’ extreme UV source in the alpha-tools
Author(s): Joseph Pankert; Rolf Apetz; Klaus Bergmann; Guenther Derra; Maurice Janssen; Jeroen Jonkers; Jurgen Klein; Thomas Kruecken; Andreas List; Michael Loeken; Christof Metzmacher; Willi Neff; Sven Probst; Ralph Prummer; Oliver Rosier; Stefan Seiwert; Guido Siemons; Dominik Vaudrevange; Dirk Wagemann; Achim Weber; Peter Zink; Oliver Zitzen
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Paper Abstract

The paper describes recent progress in the development of the Philips's EUV source. Progress has been realized at many frontiers: Integration studies of the source into a scanner have primarily been studied on the Xe source because it has a high degree of maturity. We report on integration with a collector, associated collector lifetime and optical characteristics. Collector lifetime in excess of 1 bln shots could be demonstrated. Next, an active dose control system was developed and tested on the Xe lamp. Resulting dose stability data are less than 0.2% for an exposure window of 100 pulses. The second part of the paper reports on progress in the development of the Philips' Sn source. First, the details of the concept are described. It is based on a Laser triggered vacuum arc, which is an extension with respect to previous designs. The source is furbished with rotating electrodes that are covered with a Sn film that is constantly regenerated. Hence by the very design of the source, it is scalable to very high power levels, and moreover has fundamentally solved the notorious problem of electrode erosion. Power values of 260 W in 2p sr are reported, along with a stable, long life operation of the lamp. The paper also addresses the problem of debris generation and mitigation of the Sn-source. The problem is attacked by a combined strategy of protection of the collector by traditional means (e.g. fields, foiltraps... ), and by designing the gas atmosphere according to the principles of the well known halogen cycles in incandescent lamps. These principles have been studied in the Lighting industry for decades and rely on the excessively high vapor pressures of metal halides. Transferred to the Sn source, it allows pumping away tin residues that would otherwise irreversibly deposit on the collector.

Paper Details

Date Published: 6 May 2005
PDF: 12 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598650
Show Author Affiliations
Joseph Pankert, Philips Extreme UV GmbH (Germany)
Rolf Apetz, Philips Extreme UV GmbH (Germany)
Klaus Bergmann, Fraunhofer-Institut fuer Lasertechnik (Germany)
Guenther Derra, Philips Research Labs. (Germany)
Maurice Janssen, Philips Extreme UV GmbH (Germany)
Jeroen Jonkers, Philips Extreme UV GmbH (Germany)
Jurgen Klein, Fraunhofer-Institut fuer Lasertechnik (Germany)
Thomas Kruecken, Philips Research Labs. (Germany)
Andreas List, Philips Extreme UV GmbH (Germany)
Michael Loeken, Philips Extreme UV GmbH (Germany)
Christof Metzmacher, Philips Research Labs. (Germany)
Willi Neff, Fraunhofer-Institut fuer Lasertechnik (Germany)
Sven Probst, Fraunhofer-Institut fuer Lasertechnik (Germany)
Ralph Prummer, Fraunhofer-Institut fuer Lasertechnik (Germany)
Oliver Rosier, Fraunhofer-Institut fuer Lasertechnik (Germany)
Stefan Seiwert, Fraunhofer-Institut fuer Lasertechnik (Germany)
Guido Siemons, Philips Extreme UV GmbH (Germany)
Dominik Vaudrevange, Philips Extreme UV GmbH (Germany)
Dirk Wagemann, Philips Extreme UV GmbH (Germany)
Achim Weber, Philips Research Labs. (Germany)
Peter Zink, Philips Research Labs. (Germany)
Oliver Zitzen, Philips Extreme UV GmbH (Germany)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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