Proceedings Paper
Oxidation resistance of Ru-capped EUV multilayers| Format | Member Price | Non-Member Price |
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Paper Abstract
Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.
Paper Details
Date Published: 6 May 2005
PDF: 10 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.597443
Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)
PDF: 10 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.597443
Show Author Affiliations
Sasa Bajt, Lawrence Livermore National Lab. (United States)
Zu Rong Dai, Lawrence Livermore National Lab. (United States)
Erik J. Nelson, Lawrence Livermore National Lab. (United States)
Mark A. Wall, Lawrence Livermore National Lab. (United States)
Jennifer Alameda, Lawrence Livermore National Lab. (United States)
Nhan Nguyen, Lawrence Livermore National Lab. (United States)
Sherry Baker, Lawrence Livermore National Lab. (United States)
Zu Rong Dai, Lawrence Livermore National Lab. (United States)
Erik J. Nelson, Lawrence Livermore National Lab. (United States)
Mark A. Wall, Lawrence Livermore National Lab. (United States)
Jennifer Alameda, Lawrence Livermore National Lab. (United States)
Nhan Nguyen, Lawrence Livermore National Lab. (United States)
Sherry Baker, Lawrence Livermore National Lab. (United States)
Jeffrey C. Robinson, Lawrence Livermore National Lab. (United States)
John S. Taylor, Lawrence Livermore National Lab. (United States)
Miles Clift, Sandia National Labs. (United States)
Andy Aquila, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
N. V. Ginger Edwards, SEMATECH (United States)
John S. Taylor, Lawrence Livermore National Lab. (United States)
Miles Clift, Sandia National Labs. (United States)
Andy Aquila, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
N. V. Ginger Edwards, SEMATECH (United States)
Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)
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