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Proceedings Paper

Off-synchrotron at-wavelength EUV metrology
Author(s): Andre Egbert; Stefan Becker; Boris N. Chichkov
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Paper Abstract

Compact extreme ultraviolet (EUV) laboratory sources are strongly required for the fast on-site characterization of optical components and for the precise calibration of EUV diagnostic instruments. The "EUV tube" promises to become an important tool for these applications. This source is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This allows the realization of a flexible, debris-free, and long-term stable EUV source. Silicon targets are used to generate radiation at 13.5 nm. Detailed characteristics of the source performance are reported and different examples for off-synchrotron at-wavelength metrology are presented.

Paper Details

Date Published: 6 May 2005
PDF: 7 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.597411
Show Author Affiliations
Andre Egbert, phoenix|euv Systems + Services GmbH (Germany)
Stefan Becker, phoenix|euv Systems + Services GmbH (Germany)
Boris N. Chichkov, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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