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Proceedings Paper

Study of photosensitizer for i-line lithography
Author(s): Tomoyuki Kitaori; Seiki Fukunaga; Hiroo Koyanagi; Shin'ichi Umeda; Kohtaro Nagasawa
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Paper Abstract

In this paper, diazo derivatives having various ballasts are newly evaluated as the sensitizers for i-line resist system. The selection of the ballast of the sensitizer can be executed on the basis of Dill's A parameter. The derivation of a mathematical expression, which is usable for the optimization of the quantity of a sensitizer in resist system, is also described. The experimentally obtained optimal value is confirmed to show a good fit with the value given by the expression.

Paper Details

Date Published: 1 June 1992
PDF: 20 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59734
Show Author Affiliations
Tomoyuki Kitaori, Nippon Kayaku Co., Ltd. (Japan)
Seiki Fukunaga, Nippon Kayaku Co., Ltd. (Japan)
Hiroo Koyanagi, Nippon Kayaku Co., Ltd. (Japan)
Shin'ichi Umeda, Nippon Kayaku Co., Ltd. (Japan)
Kohtaro Nagasawa, Nippon Kayaku Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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