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Proceedings Paper

Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
Author(s): William D. Hinsberg; Scott A. MacDonald; Nicholas J. Clecak; Clinton D. Snyder
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Paper Abstract

Many chemically amplified resists based on acid catalysis exhibit extreme sensitivity to trace quantities of airborne organic contaminants. This sensitivity is manifested as a rapid degradation in lithographic properties upon standing in clean room air. In this work we have studied the absorption of one such airborne contaminant, N-methylpyrollidone (NMP), by thin polymer films. NMP labeled with radioactive 14C was introduced at a concentration of 10 ppb into a stream of purified air, and the film of interest was immersed in that airstream for a predetermined time under controlled conditions. This method provides an ideal means for determining rates of NMP uptake, correlating resist lithographic performance with absorbed NMP content, and for examining the effects of film thickness and composition on rates of absorption.

Paper Details

Date Published: 1 June 1992
PDF: 9 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59723
Show Author Affiliations
William D. Hinsberg, IBM Almaden Research Ctr. (United States)
Scott A. MacDonald, IBM Almaden Research Ctr. (United States)
Nicholas J. Clecak, IBM Almaden Research Ctr. (United States)
Clinton D. Snyder, IBM Almaden Research Ctr. (United States)

Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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