
Proceedings Paper
F2-laser-induced damage on transparent fluoride crystalsFormat | Member Price | Non-Member Price |
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Paper Abstract
For the application of F2 lasers to micro-/nano-fabrication including photolithography, one of the important research subjects is to eliminate the chromatic aberration, and combination of lenses made of two optical materials with different refractive indices is the effective way. However, only CaF2 is widely applied to lenses for a vacuum ultraviolet (VUV) beam, and a "second material" to be paired with CaF2 is strongly requested. Here, we examined two fluoride crystals which are transparent in the VUV region, BaF2 and LiCaAlF6 grown by the Czochralski technique, as candidates for VUV optics. We investigated the change of the VUV transmittance and the onset of optical damage of these fluoride crystals against F2 laser irradiation. These crystals showed good optical tolerance against cumulative F2 laser irradiation, and the damage threshold of LiCaAlF6 was similar to that of VUV grade CaF2 while that of BaF2 was about half of the other two fluoride crystals.
Paper Details
Date Published: 8 October 2004
PDF: 6 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596411
Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)
PDF: 6 pages
Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); doi: 10.1117/12.596411
Show Author Affiliations
Yoshizo Kawaguchi, National Institute of Advanced Industrial Science and Technology (Japan)
Aiko Narazaki, National Institute of Advanced Industrial Science and Technology (Japan)
Tadatake Sato, National Institute of Advanced Industrial Science and Technology (Japan)
Ryozo Kurosaki, National Institute of Advanced Industrial Science and Technology (Japan)
Aiko Narazaki, National Institute of Advanced Industrial Science and Technology (Japan)
Tadatake Sato, National Institute of Advanced Industrial Science and Technology (Japan)
Ryozo Kurosaki, National Institute of Advanced Industrial Science and Technology (Japan)
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)
Hiroki Sato, Tohoku Univ. (Japan)
Tomohiko Satonaga, Tohoku Univ. (Japan)
Tsuguo Fukuda, Tohoku Univ. (Japan)
Hiroki Sato, Tohoku Univ. (Japan)
Tomohiko Satonaga, Tohoku Univ. (Japan)
Tsuguo Fukuda, Tohoku Univ. (Japan)
Published in SPIE Proceedings Vol. 5662:
Fifth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Henry Helvajian; Kazuyoshi Itoh; Kojiro F. Kobayashi; Andreas Ostendorf; Koji Sugioka, Editor(s)
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