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Proceedings Paper

Ultra-high resolution optical coherence tomography for material characterization and quality control
Author(s): Karin Wiesauer; Michael Pircher; Erich Goetzinger; Rainer Engelke; Gisela Ahrens; Gabi Gruetzner; Christoph K. Hitzenberger; David Stifter
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Paper Abstract

Optical coherence tomography (OCT), so far mainly used in the biomedical field, has a high potential as non-destructive and contactless technique for material characterization and analysis. For these applications, OCT systems with ultra-high resolution in the micrometer range and capable of high imaging speeds are required. In this work, we combine ultra-high resolution imaging using a femtosecond Ti:sapphire laser as light source with the concepts of transversal OCT. Based on acquisition by heterodyne detection via acousto-optic modulators (AOMs), and by using an xy-galvano scanner unit we are able to obtain en-face scans with sizes as large as 3 x 3 mm2 within a few seconds. The ultra-high resolution of our OCT system of 2.95 μm axially and 4 μm laterally, both in air, is shown to be essential for imaging of different compounds and fibre materials. We demonstrate the benefits of en-face scanning OCT for various applications in material investigation where in-plane information is of interest which can hardly be obtained by cross-sectional OCT.

Paper Details

Date Published: 21 March 2005
PDF: 8 pages
Proc. SPIE 5714, Commercial and Biomedical Applications of Ultrafast Lasers V, (21 March 2005); doi: 10.1117/12.593612
Show Author Affiliations
Karin Wiesauer, Upper Austrian Research GmbH (Austria)
Michael Pircher, Medizinische Univ. Wien (Austria)
Erich Goetzinger, Medizinische Univ. Wien (Austria)
Rainer Engelke, micro resist technology GmbH (Germany)
Gisela Ahrens, micro resist technology GmbH (Germany)
Gabi Gruetzner, micro resist technology GmbH (Germany)
Christoph K. Hitzenberger, Medizinische Univ. Wien (Austria)
David Stifter, Upper Austrian Research GmbH (Austria)

Published in SPIE Proceedings Vol. 5714:
Commercial and Biomedical Applications of Ultrafast Lasers V
Joseph Neev; Christopher B. Schaffer; Andreas Ostendorf; Stefan Nolte, Editor(s)

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