In the present paper the comparative analysis of organic and inorganic resists for registration of optical/digital holograms is described. The purpose of researches - to find optimum recording medium for record of the combined holographic protective elements. Organic photoresist S1800, organic PMMA electron-resist and inorganic resist - Chalcogenide Glass System (HGS) As₄₀S _60-x Se _x (where x=20,30,40) were investigated. Besides this, information characteristics resist layers of HGS were investigated with the purpose of definition optimal recording modes of optical microstructures by Electron Beam Printing System (EBPS). The correcting method of system response on forming of interactive diffraction grating is offered. It is shown, that maximal electron sensitivity have resist layers As₄₀S₄₀Se₂₀. It was revealed during researches, that for this task an organic resist S1800 series and inorganic - As₄₀S₄₀Se₂₀ are suitable. On results of our measurements it has been established that organic resist S1800 is more sensitive (more than 10 times) in comparsion with HGS and provides higher resolution (about 2500 lines per millimeter). Providing of high resolution is very important for registering Computer Generated Holograms (CGH), especially 3-D images holograms.

Date Published: 21 April 2005
PDF: 8 pages
Proc. SPIE 5742, Practical Holography XIX: Materials and Applications, (21 April 2005); doi: 10.1117/12.592161

Published in SPIE Proceedings Vol. 5742:
Practical Holography XIX: Materials and Applications
Tung H. Jeong; Hans I. Bjelkhagen, Editor(s)