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Proceedings Paper

Investigation of the process for manufacturing optoelectronic devices using nonorganic photoresists
Author(s): Sergiy Al. Kostyukevych; Andrey A. Kryuchin; Anna N. Morozovska; Viacheslav V. Petrov; Petr E. Shepeliavyi; Ekaterina V. Kostyukevich; Igor V. Tverdokhleb
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Paper Abstract

The results of experimental and theoretical investigations aimed at applying non-organic photoresists for mastering optoelectronic devices are represented. Samples for investigations were prepared using thermal evaporation of the glass with different As-S-Se compositions in vacuum onto a glass substrate. When exposing photoresist to obtain interference 2D/3D patterns, we used He-Cd laser irradiation with the wavelength 440 nm. The exposure was chosen from 20 to 150 mJ/cm2, and spatial frequencies of obtained gratings were from 600 to 3600 mm-1. The resist samples were processed using a waterless organic selective etchant based on amines. Results of investigations showed that As40S60-xSex (x=0-20) photoresist is characterized by higher holographic sensitivity (i.e. energetic expose necessary for providing given value of the diffraction efficiency). This enables us to create various combined optical-digital protective elements and master-copies for all types of optical disks (CD, DVD).

Paper Details

Date Published: 12 April 2005
PDF: 11 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.591758
Show Author Affiliations
Sergiy Al. Kostyukevych, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)
Andrey A. Kryuchin, Institute for Information Recording (Ukraine)
Anna N. Morozovska, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)
Viacheslav V. Petrov, Institute for Information Recording (Ukraine)
Petr E. Shepeliavyi, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)
Ekaterina V. Kostyukevich, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)
Igor V. Tverdokhleb, Specialized Enterprise Holography Ltd. (Ukraine)

Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

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