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Proceedings Paper

Synthesis of advanced materials by pulsed-laser deposition
Author(s): Ionela Vrejoiu; Dan Gheorghita Matei; Johannes David Pedarnig; Dieter Bauerle; Cornel Ghica; Maria Dinescu
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Paper Abstract

Advanced thin film materials with giant dielectric permittivities up to ≈ 10000 were produced by pulsed-laser deposition. Composite targets of barium titanate (BaTiO3) and polytetrafluorethylene (PTFE) were ablated with 248 nm KrF-laser radiation in Ar atmosphere. The synthesized films have a complex microstructure and contain product species which are formed during the pulsed-laser ablation / deposition process. The dielectric permittivities of films exhibit pronounced dispersion for frequencies higher than 10 kHz. Strong dependencies of the film permittivity on target composition, layer thickness, ambient gas pressure and relative humidity are revealed. The large dielectric permittivity of these film materials may be attributed to space-charge polarization phenomena. Films deposited from the same targets in oxygen atmosphere have much lower dielectric permittivity (ετ'≈ 30).

Paper Details

Date Published: 12 April 2005
PDF: 8 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.588550
Show Author Affiliations
Ionela Vrejoiu, Johannes Kepler Univ. Linz (Austria)
Dan Gheorghita Matei, Johannes Kepler Univ. Linz (Austria)
Johannes David Pedarnig, Johannes Kepler Univ. Linz (Austria)
Dieter Bauerle, Johannes Kepler Univ. Linz (Austria)
Cornel Ghica, National Institute for Laser, Plasma and Radiation Physics (Romania)
Maria Dinescu, National Institute for Laser, Plasma and Radiation Physics (Romania)


Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

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