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Proceedings Paper

Nanoimprint lithography: full wafer replication of nanometer features
Author(s): Rainer Pelzer; Cecile Gourgon; Stefan Landis; Paul Kettner
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Paper Abstract

Nanoimprint Lithography (NIL) is a fast, high resolution replication technology for micromechanics, microbiology and even for microelectronic applications in the sub-100nm range. The technique has been demonstrated to be a very promising next generation technique for large-area structure replication up to wafer-level in the micrometer and nanometer scale. For producing nanometer structures the capital investments required are much lower compared to other next generation methods (e-beam writing, x-ray lithography, EUV lithography, ...). Nanoimprint Lithography is based on two different techniques: Hot Embossing (HE) and UV-Nanoimprint Lithography (UV-NIL). Both methods can be used for replicating dense and isolated features in the range of 70nm to 100μm simultaneously on up to 200mm wafers.

Paper Details

Date Published: 23 February 2005
PDF: 4 pages
Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); doi: 10.1117/12.582435
Show Author Affiliations
Rainer Pelzer, EV Group (Austria)
Cecile Gourgon, Lab. des Technologies de la Microelectronique, CNRS (France)
Stefan Landis, CEA-LETI (France)
Paul Kettner, EV Group (Austria)

Published in SPIE Proceedings Vol. 5650:
Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II
Jung-Chih Chiao; David N. Jamieson; Lorenzo Faraone; Andrew S. Dzurak, Editor(s)

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