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Present state and development of nanometrology
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Paper Abstract

The development of micro-electronic has been entering the era of nano in advance, consequently, the measurement, metrology, trace and instrument calibration on nano scope must be up to the determined accuracy. Apart aside the traditional methods such as the aid of standard samples, the self-calibration of instrument is based on the 3D laser interference system with stabilized laser applied to SPM, which can also make the measurement result traceable to the primary standard of length unit directly. However, the complexity of instrument and the characteristic of sample make the elimination of error sources more difficult, so it is not enough to correct resolution just with methods above. The paper will introduce the statement and development of nanometrology and force on some original calibration methods.

Paper Details

Date Published: 9 February 2005
PDF: 7 pages
Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); doi: 10.1117/12.580364
Show Author Affiliations
Yu Huang, China JiLiang Univ. (China)
Ruogua Zhu, China JiLiang Univ. (China)
Bizhi Dai, China JiLiang Univ. (China)

Published in SPIE Proceedings Vol. 5635:
Nanophotonics, Nanostructure, and Nanometrology
Xing Zhu; Stephen Y. Chou; Yasuhiko Arakawa, Editor(s)

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