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Proceedings Paper

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Author(s): Toru Tojo; Ryoich Hirano; Hideo Tsuchiya; Junji Oaki; Takeshi Nishizaka; Yasushi Sanada; Kazuto Matsuki; Ikunao Isomura; Riki Ogawa; Noboru Kobayashi; Kazuhiro Nakashima; Shinji Sugihara; Hiromu Inoue; Shinichi Imai; Hitoshi Suzuki; Akihiko Sekine; Makoto Taya; Akemi Miwa; Nobuyuki Yoshioka; Katsumi Ohira; Dong-Hoon Chung; Masao Otaki
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Paper Abstract

A novel high-resolution mask inspection platform using DUV wavelength has been developed. This platform is designed to enable the defect inspection of high quality masks for 65nm node used in 193nm lithography. In this paper, newly developed optical system and its performance are reported. The system is operated at wavelength of 198.5nm, which wavelength is nearly equal to 193nm-ArF laser exposure tool. Some defect image data and defect inspection sensitivity due to simulation-base die-to-die (D/D) inspection are shown on standard programmed defect test mask. As an initial state D/D inspection performance, 20-60 nm defects are certified. System capabilities for 65nm node inspection and beyond are also discussed.

Paper Details

Date Published: 6 December 2004
PDF: 13 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.579133
Show Author Affiliations
Toru Tojo, Toshiba Corp. (Japan)
Topcon Corp. (Japan)
Ryoich Hirano, Toshiba Corp. (Japan)
Hideo Tsuchiya, Toshiba Corp. (Japan)
Junji Oaki, Toshiba Corp. (Japan)
Takeshi Nishizaka, Toshiba Corp. (Japan)
Yasushi Sanada, Toshiba Corp. (Japan)
Kazuto Matsuki, Toshiba Corp. (Japan)
Ikunao Isomura, Toshiba Corp. (Japan)
Riki Ogawa, Toshiba Corp. (Japan)
Noboru Kobayashi, Toshiba Corp. (Japan)
Kazuhiro Nakashima, Toshiba Corp. (Japan)
Shinji Sugihara, Toshiba Corp. (Japan)
Hiromu Inoue, Toshiba Corp. (Japan)
Shinichi Imai, Toshiba Corp. (Japan)
Hitoshi Suzuki, Topcon Corp. (Japan)
Akihiko Sekine, Topcon Corp. (Japan)
Makoto Taya, Topcon Corp. (Japan)
Akemi Miwa, Topcon Corp. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Katsumi Ohira, Semiconductor Leading Edge Technologies, Inc. (Japan)
Dong-Hoon Chung, Semiconductor Leading Edge Technologies, Inc. (Japan)
Masao Otaki, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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