Share Email Print

Proceedings Paper

Focused ion beam repair of binary chrome defects for the 65-nm node
Author(s): David C. Ferranti; Jeffrey G. Marshman; Roth W. Lanphear; Kenneth G. Donahue; Stephen A. Bachman; Sharon M. Szelag
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Focused Ion beam (FIB) techniques have been extended to repair masks for the 65nm node using 193nm wavelength. As historically has been the case, opaque chrome defects provide the greatest challenge for FIB repair processes. These processes have been continually refined to support ever-shrinking geometries and tighter specifications. The most critical specification is deviation of printed line CD at the wafer through a specified focus range of the repaired defect region versus an identical defect-free region. Precise edge placement and quartz damage control are the most important factors in achieving this desired result. FEI Company has developed the Accura XT FIB mask repair system with extended capabilities to keep pace with the requirements brought forth by leading edge lithography masks. The new FIB processes incorporate several newly developed repair process strategies including new beam scanning sequences, improved dynamic registration to track positional error during a repair and a new method of repair by-product removal. Printability, CD and transmission performance will be shown via data collected from the Zeiss 193 AIMSfab tool on a binary test mask with feature sizes close to 65nm geometries. Quartz damage will be shown via FEI’s SNP tool. The data presented in this paper will show that FIB repair of chrome defects is a viable solution to support the most demanding specifications for the 65nm node.

Paper Details

Date Published: 6 December 2004
PDF: 11 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004);
Show Author Affiliations
David C. Ferranti, FEI Co. (United States)
Jeffrey G. Marshman, FEI Co. (United States)
Roth W. Lanphear, FEI Co. (United States)
Kenneth G. Donahue, FEI Co. (United States)
Stephen A. Bachman, FEI Co. (United States)
Sharon M. Szelag, FEI Co. (United States)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?