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Proceedings Paper

IP protection of mask data by rebuilding the design hierarchy using OASIS format
Author(s): Kokoro Kato; Kuninori Nishizawa; Tadao Inoue; Anto Yasaka
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Paper Abstract

In this paper we present new development of intellectual properties(IP) protection software using OASIS format. By taking advantage of repetition presentation of OASIS, it becomes possible to express arrayed patterns without any generation of new cells, which also brings less overhead and further compaction of the result file. As a result, we could rebuild the hierarchy without cell generation and reduce the output file size. The experimental results show that there are no redundant cells generated and the file size has become 5 to 8 times smaller than conventional methods.

Paper Details

Date Published: 6 December 2004
PDF: 8 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.577807
Show Author Affiliations
Kokoro Kato, SII NanoTechnology Inc. (Japan)
Kuninori Nishizawa, SII NanoTechnology Inc. (Japan)
Tadao Inoue, SII NanoTechnology Inc. (Japan)
Anto Yasaka, SII NanoTechnology Inc. (Japan)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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