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Proceedings Paper

Nano-optical devices and integration based on nanopattern replications and nanolithography
Author(s): Jian Jim Wang; Lei Chen; Stephen-W. Tai; Xuegong Deng; Paul F. Sciortino; Feng Liu; Jiandong Deng; Xiaoming Liu; Anguel Nikolov; Dino Sinatore
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Paper Abstract

We developed a nano-manufacturing platform based on wafer level nano-replication with mold and nano-pattern transfer by nano-lithography. The nano-replication process, which based on imprinting a single-layer spin-coated UV curable resist, achieved excellent nano-patterning fidelity and on-wafer uniformity with high-throughput. Nano-optic devices, such as, quarter wave plates and polarizers, were manufactured with the nano-manufacturing platform. Excellent wafer level performance and yield were achieved. The developed technology is suitable for high-throughput and low cost manufacturing needs for commercializing nano-structure based optical devices and integrated optical devices.

Paper Details

Date Published: 19 January 2005
PDF: 12 pages
Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, (19 January 2005); doi: 10.1117/12.570040
Show Author Affiliations
Jian Jim Wang, NanoOpto Corp. (United States)
Lei Chen, NanoOpto Corp. (United States)
Stephen-W. Tai, NanoOpto Corp. (United States)
Xuegong Deng, NanoOpto Corp. (United States)
Paul F. Sciortino, NanoOpto Corp. (United States)
Feng Liu, NanoOpto Corp. (United States)
Jiandong Deng, NanoOpto Corp. (United States)
Xiaoming Liu, NanoOpto Corp. (United States)
Anguel Nikolov, NanoOpto Corp. (United States)
Dino Sinatore, NanoOpto Corp. (United States)

Published in SPIE Proceedings Vol. 5592:
Nanofabrication: Technologies, Devices, and Applications
Warren Y-C. Lai; Stanley Pau; O. Daniel Lopez, Editor(s)

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