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Proceedings Paper

Issues associated with the commercialization of phase-shift masks
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Paper Abstract

Issues associated with the commercialization of phase shift masks are discussed. Design layouts incorporating multiphase transitions and voting are presented along with methods of mask fabrication. Issues associated with mask inspection and repair are discussed, along with data on actual reticles produced using the prescribed method of manufacture. Cost of reticles in relation to potential wafer processing gains are compared along with problems associated with the increased complexity of the mask making process.

Paper Details

Date Published: 1 January 1992
PDF: 29 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56947
Show Author Affiliations
John L. Nistler, Advanced Micro Devices, Inc. (United States)
Greg P. Hughes, DuPont Photomasks (United States)
Andrew J. Muray, ETEC Systems, Inc. (United States)
James N. Wiley, KLA Instruments Corp. (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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