In a joint project with LEICA LMW, the PTB has developed a standard comparator based on the LMS 2000 mask measuring machine. The properties of the machine and the objects (mask standards) were investigated. Means for error corrections were derived and the traceability to the unit of length is achieved. 7 inch photomask standards consisting of two dimensional arrays of crossed lines are calibrated with respect to x/y locations, length, straigthness orthogonality. The positions of each cross is certified with an uncertainty better than 50 nm x 50 nm. Thus, for the first time a calibrated two dimensional mask standard with appropriate uncertainty has become available.

Date Published: 1 January 1992
PDF: 12 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56945

Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)