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Proceedings Paper

Aerial image measuring system at 193 nm: a tool-to-tool comparison and global CD mapping
Author(s): Axel M. Zibold; Rainer Schmid; Klaus Boehm; Robert Birkner
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Paper Abstract

Reticle inspection and qualification is getting very important due to the overall shrinking feature sizes on chips and CD values less than the exposure wavelength. Mask defects will matter increasingly and successful defect disposition and image qualification is becoming essential to improve yield. Currently ongoing studies demonstrate the beneficial use of AIMSTM* (Aerial Image Measuring System) -besides its application in mask shops like repair verification- for various wafer fab applications like Incoming Qualitiy Check (IQC), Automated Reticle Defect Disposition (ARDD)1, OPC verification or litho process evaluation in engineering without the use of stepper time and image qualification through wafer SEM evaluation. Among the important questions for the use of an aerial image measuring system is the level on which different tools compare to each other in terms of critical system performance parameters in order to judge the results of the data analysis in a global way. In this work we conducted a tool to tool comparison study of AIMSTM fab 193 systems investigating parameters like: Normalized illumination uniformity, CD (critical dimension) uniformity over field, and static CD repeatability over time in x- and y-directions. The study is based on the evaluation of a data base collected with typical feature sizes of 1μm on the mask, ensuring with such feature sizes that tool results are independent of mask features being close to the resolution limit or the printability capability. Typical settings are NA = 0.7 and circular sigma = 0.6 on a set of tools in the field as well as in-house. In addition the performance of the tools will be discussed in terms of a specific application, global CD mapping, for use in process control. It can be applied for different use in wafer fab and mask shop environment.

Paper Details

Date Published: 6 December 2004
PDF: 8 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569283
Show Author Affiliations
Axel M. Zibold, Carl Zeiss SMS GmbH (Germany)
Rainer Schmid, Carl Zeiss SMS GmbH (Germany)
Klaus Boehm, Carl Zeiss SMS GmbH (Germany)
Robert Birkner, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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