Share Email Print

Proceedings Paper

High-resolution actinic imaging and phase metrology of 193-nm CPL reticles
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The recent introduction of chromeless-phase lithography (CPL) has provided lithographers with a powerful wavefront engineering tool for patterning at k1 values below 0.3. Reliable image formation at such extreme k1 requires a well-characterized CPL photomask. However, the limitations of available optical inspection tools have made the test and measurement of CPL photomasks a difficult task. In this paper, we describe preliminary imaging and phase metrology results on a leading-edge CPL reticle using an high-resolution 193-nm microscope. This microscope features a solid-state 5-kHz repetition rate, 193.4 nm actinic light source in conjunction with high-numerical-aperture (0.75 NA) optics to provide 200X magnification, 150-nm Rayleigh resolution and 35-nm pixel size over a 30-micron image field. A recently-developed phase metrology architecture facilitates optical path difference (OPD) measurements of isolated or dense features on a sub-200-nm spatial scale. We discuss the phase measurement process and present images and corresponding OPD measurements of line and contact structures on an ArF CPL reticle that is designed mainly for the 65 nm technology node. We compare these OPD measurements with predictions based on surface nano-profilometer (SNP) step-height measurements of the same feature regions.

Paper Details

Date Published: 6 December 2004
PDF: 11 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569274
Show Author Affiliations
Andrew J. Merriam, Actinix (United States)
James J. Jacob, Actinix (United States)
Douglas Van Den Broeke, ASML MaskTools, Inc. (United States)
Stephen Hsu, ASML MaskTools, Inc. (United States)
J. Fung Chen, ASML MaskTools, Inc. (United States)
Bryan Kasprowicz, Photronics Inc. (United States)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?