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Proceedings Paper

Overcoming substrate defect decoration effects in EUVL mask blank development
Author(s): Patrick A. Kearney; Rajul V. Randive; Andy Ma; David Krick; Al Weaver; Ira Reiss; Daniel Abraham; Paul B. Mirkarimi; E. Spiller
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Paper Abstract

Mask blanks for extreme ultraviolet lithography (EUVL) are fabricated by depositing Mo/Si multilayer films on 6” square super polished substrates. These mask blanks must be almost defect-free and development of a suitable multiplayer deposition tool and process is crucial for the commercialization of EUVL. We will show that using current, real-world quartz substrates and our state-of-the-art defect inspection tool, that substrate defect decoration is an obstacle; this means that there appear to be many non-detectable substrate defects that become detectable once a reflective coating is deposited. This makes it very challenging to conduct accurate defect root cause analysis experiments. We have overcome this obstacle: it entails characterizing an already coated substrate for defects, which provides a suitable reference from which to measure the defects in the multilayer coating that is subsequently applied. We will demonstrate that this is a viable technique and that it enables a suitable defect baseline to be obtained; this is crucial to performing accurate root cause analysis experiments for potential defect sources/mechanisms.

Paper Details

Date Published: 6 December 2004
PDF: 7 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569271
Show Author Affiliations
Patrick A. Kearney, International SEMATECH (United States)
Rajul V. Randive, Veeco Instruments Inc. (United States)
Andy Ma, International SEMATECH (United States)
David Krick, International SEMATECH (United States)
Al Weaver, Veeco Instruments Inc. (United States)
Ira Reiss, Veeco Instruments Inc. (United States)
Daniel Abraham, Veeco Instruments Inc. (United States)
Paul B. Mirkarimi, Lawrence Livermore National Lab. (United States)
E. Spiller, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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