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Proceedings Paper

Nanostructure generation based on laser cooling and mechanical mask
Author(s): Xian Zhong Chen; Ting Wen Xing; Jian Ping Shi; Xu Nan Chen; Han Min Yao
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Paper Abstract

The basic principle and the overall scheme of a new technique for nanostructure fabarication are described, and experimental results are given. A thermal atomic beam effusing out of an oven is firstly collimated by a small aperture and then collimated to a high degree by a polarization gradient laser field. This well-collimated atomic beam is patterned by a mechanical mask, and nanostructures are generated by atomic deposition. SEM profiles of nanostructures have shown that the feature size of the structure can reach nanometer scale. Compared to other micro-lithographic techniques, this technique has many advantages such as low cost, high throughput, mass production, simple process etc.

Paper Details

Date Published: 9 February 2005
PDF: 8 pages
Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); doi: 10.1117/12.568785
Show Author Affiliations
Xian Zhong Chen, Institute of Optics and Electronics, CAS (China)
Ting Wen Xing, Institute of Optics and Electronics, CAS (China)
Jian Ping Shi, Institute of Optics and Electronics, CAS (China)
Xu Nan Chen, Institute of Optics and Electronics, CAS (China)
Han Min Yao, Institute of Optics and Electronics, CAS (China)

Published in SPIE Proceedings Vol. 5635:
Nanophotonics, Nanostructure, and Nanometrology
Xing Zhu; Stephen Y. Chou; Yasuhiko Arakawa, Editor(s)

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