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Proceedings Paper

Evaluation of a new-generation photomask develop system for CAR
Author(s): Rusty Cantrell; Martin Tschinkl; Axel Feicke; Wolfram Porsche; Gaston Lee; Tatsuhito Kotoda; Peter Tichy; Takahiro Fukai; Shigenori Kamei; Hiroshi Asai
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Paper Abstract

A new photomask develop tool designed by Tokyo Electron Limited (TEL) with wafer puddle technology was evaluated at the Advanced Mask Technology Center (AMTC) in Dresden, Germany. Parameters selected for this evaluation were resist dark loss uniformity, critical dimension (CD) uniformity, loading, linearity, resist cross sectional images, and defects using chemically amplified resists (CARs) exposed with DUV (l=257nm) and 50KeV e-beam pattern generators. Implementing wafer puddle technology to photomask developing was not a simple, straightforward process. Standard CAR puddle recipes for wafer developing were inadequate to match CDU requirements for photomasks at the 130nm technology node using DUV exposure. While the results were disappointing, the TEL alpha develop tool cannot be held entirely responsible. Other, non-develop tool related factors such as resist, substrate, coating bake temperature and time, lithography tool, and post exposure bake temperature and time, all contributed to the final post develop results. Indeed, other CAR/substrate combinations exposed at 50keV e-beam and processed on the TEL alpha develop tool were markedly better in CD performance when compared to DUV results. The AMTC has recently taken delivery of a full scale, production worthy, TEL photomask develop tool for use at future technology nodes.

Paper Details

Date Published: 6 December 2004
PDF: 11 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568393
Show Author Affiliations
Rusty Cantrell, Advanced Mask Technology Ctr. (Germany)
Martin Tschinkl, Advanced Mask Technology Ctr. (Germany)
Axel Feicke, Advanced Mask Technology Ctr. (Germany)
Wolfram Porsche, Advanced Mask Technology Ctr. (Germany)
Gaston Lee, Advanced Mask Technology Ctr. (Germany)
Tatsuhito Kotoda, Tokyo Electron Deutschland GmbH (Germany)
Peter Tichy, Tokyo Electron Deutschland GmbH (Germany)
Takahiro Fukai, Tokyo Electron Ltd. (Japan)
Shigenori Kamei, Tokyo Electron Ltd. (Japan)
Hiroshi Asai, Tokyo Electron Ltd. (Japan)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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